Efficient, low leakage inductance, multi-tap, RF transformer and method of ...
... power supplies, RF induction power supplies, and RF plasma power supplies. The efficiency of the transformer is on the order of 99% to 99.7%. These efficiencies have been measured at power levels of 3 ...
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High density plasma deposition and etching apparatus
... and associated power supplies (48), the process chamber (18), and the means to couple plasma from the generator to substrates or targets, including magnetic means (36) to enhance plasma uniformity at ...
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PLASMA DEPOSITION METHOD AND SYSTEM
A plasma processing system for producing plasma with the energy of a power applied between first and second electrodes which are provided in a vacuum vessel so as to face each other in parallel and ...
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CAPACITIVELY COUPLED PLASMA REACTOR
... a processing plasma in the plasma region by transmitting electrical power from a power source to the plasma region while a gas is present in the plasma region; and power supplies for applying a VHF ...
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Plasma processing method and plasma processing apparatus
... and the impedance variable range is changed as plasma processing proceeds. Another plasma processing method employing a plurality of power supply systems having high frequency power supplies and ...
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Plasma ion source mass spectrometer
A scanning electrode scans the ion beam, and a detector detects ions that have passed through the mass filter and provides a corresponding output signal. A power supplies a scanning signal to the ...
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PLASMA ETCH REACTOR AND METHOD
... 48). The configuration of the plasma etch reactor (20) enhances the range of densities for the plasma in the reactor (20), which range can be selected by adjusting more of the power supplies (30, 32). ...
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Plasma processing apparatus and plasma processing method
Patent Publication Date: and having the same frequency, according to which the phase of the high frequencies from the first and second power supplies are varied by 180°. Patent information provided by ...
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TANDEM ETCH CHAMBER PLASMA PROCESSING SYSTEM
... and one of a plurality of power supplies connected to each plasma generation device. The output frequency of the plurality of power supplies are phase and/or frequency locked together. Additionally, ...
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Single electrode, multiple frequency plasma apparatus
Plasma processing is accomplished with an improved single electrode reactor apparatus. High and low frequency power supplies are coupled to the single electrode by way of a multi-stage passive filter ...
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N2 Power: Power Supplies
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Premier Magnetics: Power Supplies
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