Linear inductive plasma pump for process reactors
... process reactors. Document Type: Application. Inventor: Mitrovic, Andrej, S.;Johnson, Wayne, L.. Applicant: Assignee: Patent Number: 20030123992 20030123992A1 20030123992 A1 20,030,123,992 20,030,123, ...
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Linear inductive plasma pump for process reactors
... process reactors. Document Type: Patent. Inventor: Mitrovic, Andrej S.;Johnson, Wayne L.. Applicant: Assignee: Tokyo Electron Limited. Patent Number: 06824363 06824363B2 06824363 B2 06,824,363 06,824, ...
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Modular process system
A modular semiconductor wafer processing system comprises a plurality of detachable process reactors and other types of generators that can be quick-clamped to any of several ports on the lid of a ...
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A CLOSED-DRIFT HALL EFFECT PLASMA VACUUM PUMP FOR PROCESS REACTORS
... PROCESS REACTORS. Document Type: Application. Inventor: Applicant: TOKY0 ELECTRON LIMITED. Assignee: Patent Number: 2002104085 2002104085A2 2002104085 A2 2,002,104,085 2,002,104,085A2 2002104085 ...
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MODEL-BASED PREDICTIVE CONTROL OF THERMAL PROCESSING
... is described for use in thermal process reactors. A multivariable temperature response is predicted using a nonlinear parameterized model of a thermal process reactor. The nonlinear parameterized ...
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Multi-layer susceptor for rapid thermal process reactors
... process reactors. Document Type: Application. Inventor: Applicant: MOORE EPITAXIAL, INC.. Assignee: Patent Number: 0746009 0746009A1 0746009 A1 0,746,009 0,746,009A1 746009 746009A1 746,009 746,009A1 ...
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Closed-drift hall effect plasma vacuum pump for process reactors
... process reactors. Document Type: Application. Inventor: Quon, Bill, H.;Antley, Samuel, S.;Mitrovic, Andrej, S.. Applicant: Assignee: Patent Number: 20040151595 20040151595A1 20040151595 A1 20,040,151, ...
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Model-based predictive control of thermal processing
... temperature control system is described for use in thermal process reactors. A multivariable temperature response is predicted using a nonlinear parameterized model of a thermal process reactor. The ...
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METHOD FOR THE DETERMINATION OF GASEOUS CHEMICAL COMPONENTS IN A PROCESS REACTOR...
Said process reactors can be embodied as sputter-process reactors. The process reactor has at least one process chamber (12), wherein said electrical components are treated. In order to perform exact ...
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Multi-layer susceptor for rapid thermal process reactors
... process reactors. Document Type: Patent. Inventor: Moore, Gary M.. Applicant: Assignee: Moore Epitaxial, Inc.. Patent Number: 05580388 05580388A 05580388 A 05,580,388 05,580,388A 5580388 5580388A 5, ...
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